Deeply hydrate your complexion with 111SKIN’s leave-on mask a plumping formula that leaves you
looking more radiant than before. With a sumptuous melting consistency the mask sinks into
skin to replenish and revitalised the driest most dehydrated areas. Perfect for stressed
complexions that are often exposed to pollutants the mask boasts a concentrated blend of
ingredients that can be left on skin following your usual cleansing and toning routine. Whether
you’re using during the day or at night the mask protects your skin to promote long-lasting
comfort. Blended with an all-important Moisture Complex the mask harnesses the moisturising
properties of Hyaluronic Acid Alginate Pullulan Urea Serine and Glycerine all of which work
together in a seamless matrix. This creates an invisible barrier to reduce water loss keeping
moisture where it needs to be. An added Amino Acid Complex uses a biochemical process to give
your complexion photoprotection making signs of sun damage less noticeable. Finished off with
a nourishing botanical Wu Zhu Yu microcirculation will be supported encouraging a brighter
end result.
