EAN: 9781461486596

SPRINGERBRIEFS IN MATERIALS HELIUM ION MICROS...

Helium Ion Microscopy: Principles and Applications describes the theory and discusses the
practical details of why scanning microscopes using beams of light ions - such as the Helium
Ion Microscope (HIM) - are destined to become the imaging tools of choice for the 21st century.
Topics covered include the principles  operation  and performance of the Gaseous Field Ion
Source (GFIS)  and a comparison of the optics of ion and electron beam microscopes including
their operating conditions  resolution  and signal-to-noise performance. The physical
principles of Ion-Induced Secondary Electron (iSE) generation by ions are discussed  and an
extensive database of iSE yields for many elements and compounds as a function of incident ion
species and its energy is included. Beam damage and charging are frequently outcomes of ion
beam irradiation  and techniques to minimize such problems are presented. In addition to
imaging  ions beams can be used for the controlled deposition  or removal  of selected
materials with nanometer precision. The techniques and conditions required for nanofabrication
are discussed and demonstrated. Finally  the problem of performing chemical microanalysis with
ion beams is considered. Low energy ions cannot generate X-ray emissions  so alternative
techniques such as Rutherford Backscatter Imaging (RBI) or Secondary Ion Mass Spectrometry
(SIMS) are examined.

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