Thin rare earth (RE) oxide films are emerging materials for microelectronic nanoelectronic
and spintronic applications. The state-of-the-art of thin film deposition techniques as well as
the structural physical chemical and electrical properties of thin RE oxide films and of
their interface with semiconducting substrates are discussed. The aim is to identify proper
methodologies for the development of RE oxides thin films and to evaluate their effectiveness
as innovative materials in different applications.
