This book highlights the latest advances in chemical and physical methods for thin-film
deposition and surface engineering including ion- and plasma-assisted processes focusing on
explaining the synthesis processing-structure-properties relationship for a variety of
thin-film systems. It covers topics such as advances in thin-film synthesis new thin-film
materials: diamond-like films granular alloys high-entropy alloys oxynitrides and
intermetallic compounds ultra-hard wear- and oxidation-resistant and multifunctional coatings
superconducting magnetic semiconducting and dielectric films electrochemical and
electroless depositions thin-film characterization and instrumentation and industrial
applications.
